RAID - Phase 2 : Team Phase 2 a Skill up - créé par [TDA] Miloss le 25/06/2020
Description :
En test
En test
Sten
LVL 18
 HP |
28081 (19521) |
|---|---|
 ATK |
855 (269) |
 DEF |
983 (416) |
 SPD |
65 (7) |
 CRIT % |
32 % (17 %) |
 CRIT DMG |
164 % (14 %) |
 ACC |
15 % |
 RES |
61 % (6 %) |
 EHP
|
106872 |
| HP |
+4003 |
| HP |
+4 % |
| DEF |
+32 |
| DEF |
+19 % |
| ATK |
+115 |
Glyph efficiency
Basic
80
Support
72
Debuf.
51
| HP |
+1458 |
| HP |
+338 |
| DEF |
+5 % |
| ATK |
+3 % |
| RES |
+6 % |
| SPD |
+4 |
Glyph efficiency
Basic
56
Support
50
Debuf.
32
| HP |
+43 % |
| HP |
+149 |
| DEF |
+26 |
| DEF |
+5 % |
| ATK |
+9 % |
| % CRIT |
+7 % |
Glyph efficiency
Basic
61
Support
25
Debuf.
23
| HP |
+59 % |
| HP |
+3 % |
| DEF |
+4 % |
| ATK |
+8 % |
| % CRIT |
+10 % |
| CRIT |
+6 % |
Glyph efficiency
Basic
64
Dps
12
Support
29
Debuf.
28
| HP |
+35 % |
| HP |
+271 |
| DEF |
+28 |
| DEF |
+8 % |
| ATK |
+36 |
| SPD |
+3 |
Glyph efficiency
Basic
52
Support
45
Debuf.
41
| HP |
+8 % |
| HP |
+291 |
| DEF |
+98 |
| CRIT |
+8 % |
Glyph efficiency
Basic
57
Support
46
Debuf.
41
Sten
LVL 1
| HP |
24079 (16927) |
|---|---|
| ATK |
568 (72) |
| DEF |
813 (337) |
| SPD |
69 (11) |
| CRIT % |
31 % (16 %) |
| CRIT DMG |
196 % (46 %) |
| ACC |
25 % (10 %) |
| RES |
65 % (10 %) |
|
EHP
|
76543 |
| HP |
+2367 |
| DEF |
+15 % |
| CRIT |
+7 % |
Glyph efficiency
Basic
40
Support
30
Debuf.
42
| HP |
+2324 |
| DEF |
+31 |
| DEF |
+9 % |
| % CRIT |
+5 % |
| CRIT |
+8 % |
| ACC |
+6 % |
Glyph efficiency
Basic
67
Support
51
Debuf.
57
| HP |
+45 % |
| HP |
+364 |
| DEF |
+7 % |
| % CRIT |
+4 % |
| ACC |
+4 % |
| RES |
+4 % |
Glyph efficiency
Basic
60
Support
45
Debuf.
38
| HP |
+31 % |
| DEF |
+35 |
| ATK |
+32 |
| CRIT |
+12 % |
| RES |
+3 % |
| SPD |
+4 |
Glyph efficiency
Basic
53
Support
29
Debuf.
21
| HP |
+59 % |
| DEF |
+16 % |
| ATK |
+40 |
| % CRIT |
+3 % |
| CRIT |
+6 % |
| RES |
+3 % |
Glyph efficiency
Basic
64
Support
55
Debuf.
29
| HP |
+31 % |
| DEF |
+24 |
| DEF |
+5 % |
| % CRIT |
+4 % |
| CRIT |
+13 % |
| SPD |
+7 |
Glyph efficiency
Basic
64
Support
36
Debuf.
34
Adair
LVL 22
| HP |
21481 (12993) |
|---|---|
| ATK |
861 (80) |
| DEF |
1034 (544) |
| SPD |
70 (9) |
| CRIT % |
30 % (15 %) |
| CRIT DMG |
169 % (19 %) |
| ACC |
15 % |
| RES |
59 % (4 %) |
|
EHP
|
86042 |
| DEF |
+265 |
| HP |
+155 |
| HP |
+10 % |
| DEF |
+76 |
| ATK |
+29 |
| RES |
+4 % |
Glyph efficiency
Basic
68
Support
77
Debuf.
62
| DEF |
+4 % |
| DEF |
+30 |
Glyph efficiency
Basic
10
Support
10
Debuf.
9
| HP |
+3577 |
| HP |
+4 % |
| DEF |
+43 |
| DEF |
+7 % |
| ATK |
+3 % |
| SPD |
+6 |
Glyph efficiency
Basic
57
Support
51
Debuf.
63
| HP |
+500 |
| HP |
+207 |
Glyph efficiency
Basic
9
Support
24
Debuf.
23
| HP |
+1458 |
| DEF |
+56 |
| DEF |
+4 % |
| ATK |
+28 |
| % CRIT |
+3 % |
| CRIT |
+7 % |
Glyph efficiency
Basic
50
Support
42
Debuf.
39
| HP |
+59 % |
| HP |
+220 |
| HP |
+8 % |
| % CRIT |
+12 % |
| CRIT |
+12 % |
| SPD |
+3 |
Glyph efficiency
Basic
80
Dps
11
Support
33
Debuf.
46
Berg
LVL 35
| HP |
38757 (30339) |
|---|---|
| ATK |
834 (152) |
| DEF |
1205 (308) |
| SPD |
75 (18) |
| CRIT % |
15 % |
| CRIT DMG |
171 % (21 %) |
| ACC |
32 % (17 %) |
| RES |
98 % (28 %) |
|
EHP
|
182696 |
| HP |
+3433 |
| HP |
+231 |
| HP |
+9 % |
| DEF |
+89 |
| ACC |
+6 % |
| RES |
+10 % |
Glyph efficiency
Basic
98
Support
90
Debuf.
68
| HP |
+3068 |
| HP |
+354 |
| HP |
+3 % |
| DEF |
+10 % |
| RES |
+11 % |
| SPD |
+3 |
Glyph efficiency
Basic
77
Support
92
Debuf.
60
| HP |
+59 % |
| HP |
+9 % |
| DEF |
+22 |
| ATK |
+8 % |
| RES |
+7 % |
| SPD |
+7 |
Glyph efficiency
Basic
76
Support
75
Debuf.
40
| HP |
+47 % |
| HP |
+159 |
| HP |
+17 % |
| CRIT |
+6 % |
| ACC |
+7 % |
| SPD |
+4 |
Glyph efficiency
Basic
77
Support
60
Debuf.
66
| HP |
+59 % |
| HP |
+364 |
| HP |
+4 % |
| DEF |
+43 |
| ATK |
+29 |
| SPD |
+4 |
Glyph efficiency
Basic
54
Support
63
Debuf.
44
| HP |
+55 % |
| HP |
+8 % |
| DEF |
+64 |
| ATK |
+10 % |
| CRIT |
+15 % |
| ACC |
+4 % |
Glyph efficiency
Basic
89
Support
42
Debuf.
45